Business Type Manufacturer
Location Osaka, Japan
Year Established 1998
Main Markets Eastern Asia, Domestic Market, Western Europe, Sou
Main Products Polishing Pad,Polishing Slurry,Sapphire Polishing Pad, Sapphire Polishing Slussy, Silicon Wafer Polishing,
Country/Region Japan
Company Introduction
1969: Rodel Inc. founded in Newark, Delaware, USA
1983: Nitta Corporation and Rodel Inc. (currently the Dow Chemical Company) found Rodel Nitta Corporation (our company) as a joint venture
1984: Imports and sales of slurry produced by Nalco Company (via Rodel Inc.) and the SUBA series produced by Rodel Inc. begin, TA (Template Assembly) production begins
1988: With the introduction of new technology, production of the SUBA series of polishing cloths begins
1989: Utilizing our company's technology, production of the MH series of polishing cloths begins, provision of polishing systems to the Rodel Inc. chemical mechanical polishing (CMP) division begins
1992: Utilizing our company's technology, production of the R300 series of mounting film begins
1993: Provision of polishing systems to domestic device manufacturers begins
1995: Rodel Inc. obtains ISO 9001 certification; with the introduction of new technology, construction of a slurry production factory (mainly CMP slurry) in Mie Prefecture is approved
1996: Mie factory completed, Nara factory expanded
1997: Domestic production of CMP slurry begins at Mie factory, ISO 9001 certification obtained
1998: Mie factory expanded (second stage), production of IC1000 CMP pad series begins
1999: Mie factory expanded (third stage)
2000: Rodel Particle Inc. founded
2001: ISO 14001 certification obtained
2003: 20th anniversary of founding, clearing of the planned site of the Kyoto factory completed
2004: Rodel Inc. acquired in a merger, parent company becomes the Rohm and Haas Company, company name changed to Nitta Haas Incorporated, SAP system introduced
2005: Kyoto factory completed, Mie factory expanded (fourth stage)
2006: Relocation from Nara factory to Kyoto factory, Kyoto Technical Center established
2009: Rohm and Haas Company acquired in a merger, parent company becomes the Dow Chemical Company
2013: 30th anniversary of founding
Note: SUBA, MH, and IC1000 are products trademarked by our company.
1983: Nitta Corporation and Rodel Inc. (currently the Dow Chemical Company) found Rodel Nitta Corporation (our company) as a joint venture
1984: Imports and sales of slurry produced by Nalco Company (via Rodel Inc.) and the SUBA series produced by Rodel Inc. begin, TA (Template Assembly) production begins
1988: With the introduction of new technology, production of the SUBA series of polishing cloths begins
1989: Utilizing our company's technology, production of the MH series of polishing cloths begins, provision of polishing systems to the Rodel Inc. chemical mechanical polishing (CMP) division begins
1992: Utilizing our company's technology, production of the R300 series of mounting film begins
1993: Provision of polishing systems to domestic device manufacturers begins
1995: Rodel Inc. obtains ISO 9001 certification; with the introduction of new technology, construction of a slurry production factory (mainly CMP slurry) in Mie Prefecture is approved
1996: Mie factory completed, Nara factory expanded
1997: Domestic production of CMP slurry begins at Mie factory, ISO 9001 certification obtained
1998: Mie factory expanded (second stage), production of IC1000 CMP pad series begins
1999: Mie factory expanded (third stage)
2000: Rodel Particle Inc. founded
2001: ISO 14001 certification obtained
2003: 20th anniversary of founding, clearing of the planned site of the Kyoto factory completed
2004: Rodel Inc. acquired in a merger, parent company becomes the Rohm and Haas Company, company name changed to Nitta Haas Incorporated, SAP system introduced
2005: Kyoto factory completed, Mie factory expanded (fourth stage)
2006: Relocation from Nara factory to Kyoto factory, Kyoto Technical Center established
2009: Rohm and Haas Company acquired in a merger, parent company becomes the Dow Chemical Company
2013: 30th anniversary of founding
Note: SUBA, MH, and IC1000 are products trademarked by our company.